Computer-aided engineering system for design of sequence arrays and lithographic masks

Patent · Mon Jan 01 00:00:00 EST 1996

OSTI ID:870673

Hubbell, Earl A ^[1]; Morris, MacDonald S ^[2]; Winkler, James L ^[3]

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1. Mt. View, CA
2. San Jose, CA
3. Palo Alto, CA

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).

• Research Organization: Affymax Research Institute
• DOE Contract Number: FG03-92ER81275
• Assignee: Affymax Technologies N.V. (Curaco, AN)
• Patent Number(s): US 5571639
• OSTI ID: 870673
• Country of Publication: United States
• Language: English

Related Subjects

computer-aided
engineering
design
sequence
arrays
lithographic
masks
improved
set
computer
tools
forming
according
aspect
100
select
probes
layout
array
dna
polymers
beneficial
characteristics
chip
files
104
generate
110
lithographic masks
sequence arrays
select probes
beneficial characteristics
computer tools
computer-aided engineering
chip design
generate lithographic
design files
improved set
forming arrays
lithographic mask
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