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Title: Dual beam optical system for pulsed laser ablation film deposition

Patent ·
OSTI ID:870610

A laser ablation apparatus having a laser source outputting a laser ablation beam includes an ablation chamber having a sidewall, a beam divider for dividing the laser ablation beam into two substantially equal halves, and a pair of mirrors for converging the two halves on a surface of the target from complementary angles relative to the target surface normal, thereby generating a plume of ablated material emanating from the target.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
DOE Contract Number:
AC05-84OR21400
Assignee:
Martin Marietta Energy Systems, Inc. (Oak Ridge, TN)
Patent Number(s):
US 5558788
OSTI ID:
870610
Country of Publication:
United States
Language:
English

References (9)

Epitaxial growth of YBa 2 Cu 3 O 7− x thin films by a laser evaporation process journal October 1988
Characterization of ground‐state neutral and ion transport during laser ablation of Y 1 Ba 2 Cu 3 O 7− x using transient optical absorption spectroscopy journal November 1989
Layered Growth Of HTSC Thin Films Using Pulsed Laser Deposition conference March 1990
Y‐Ba‐Cu‐O thin films grown on rigid and flexible polycrystalline yttria‐stabilized zirconia by pulsed laser ablation journal July 1990
Pulsed laser deposition of thin superconducting films of Ho 1 Ba 2 Cu 3 O 7x and Y 1 Ba 2 Cu 3 O 7 − x journal December 1988
Particulates reduction in laser‐ablated YBa 2 Cu 3 O 7−δ thin films by laser‐induced plume heating journal May 1990
Physics Of In-Situ Laser Deposition Of Superconducting Thin Films conference March 1990
Characterization of Ground State Neutral and Ion Transport During Laser Ablation of 1:2:3 Superconductors by Transient Optical Absorption Spectroscopy journal January 1989
Spectroscopic and Ion Probe Characterization of the Transport Process Following Laser Ablation of Yba 2 Cu 3 O x journal January 1990