Method for materials deposition by ablation transfer processing
- San Jose, CA
A method in which a thin layer of semiconducting, insulating, or metallic material is transferred by ablation from a source substrate, coated uniformly with a thin layer of said material, to a target substrate, where said material is desired, with a pulsed, high intensity, patternable beam of energy. The use of a patternable beam allows area-selective ablation from the source substrate resulting in additive deposition of the material onto the target substrate which may require a very low percentage of the area to be covered. Since material is placed only where it is required, material waste can be minimized by reusing the source substrate for depositions on multiple target substrates. Due to the use of a pulsed, high intensity energy source the target substrate remains at low temperature during the process, and thus low-temperature, low cost transparent glass or plastic can be used as the target substrate. The method can be carried out atmospheric pressures and at room temperatures, thus eliminating vacuum systems normally required in materials deposition processes. This invention has particular application in the flat panel display industry, as well as minimizing materials waste and associated costs.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Number(s):
- US 5508065
- OSTI ID:
- 870375
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
materials
deposition
ablation
transfer
processing
layer
semiconducting
insulating
metallic
material
transferred
source
substrate
coated
uniformly
target
desired
pulsed
intensity
patternable
beam
energy
allows
area-selective
resulting
additive
require
percentage
covered
placed
required
waste
minimized
reusing
depositions
multiple
substrates
due
remains
temperature
process
low-temperature
cost
transparent
glass
plastic
carried
atmospheric
pressures
temperatures
eliminating
vacuum
systems
normally
processes
particular
application
flat
panel
display
industry
minimizing
associated
costs
vacuum systems
metallic material
particular application
energy source
atmospheric pressure
deposition process
flat panel
deposition processes
target substrate
panel display
transparent glass
multiple target
transfer process
coated uniformly
parent glass
target substrates
normally require
atmospheric pressures
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