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Title: Periodic dielectric structure for production of photonic band gap and method for fabricating the same

Patent ·
OSTI ID:869833

A method for fabricating a periodic dielectric structure which exhibits a photonic band gap. Alignment holes are formed in a wafer of dielectric material having a given crystal orientation. A planar layer of elongate rods is then formed in a section of the wafer. The formation of the rods includes the step of selectively removing the dielectric material of the wafer between the rods. The formation of alignment holes and layers of elongate rods and wafers is then repeated to form a plurality of patterned wafers. A stack of patterned wafers is then formed by rotating each successive wafer with respect to the next-previous wafer, and then placing the successive wafer on the stack. This stacking results in a stack of patterned wafers having a four-layer periodicity exhibiting a photonic band gap.

Research Organization:
Ames Laboratory (AMES), Ames, IA; Iowa State Univ., Ames, IA (United States)
DOE Contract Number:
W-7405-ENG-82
Assignee:
Iowa State University Research Foundation (Ames, IA)
Patent Number(s):
US 5406573
OSTI ID:
869833
Country of Publication:
United States
Language:
English

References (13)

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Radiation properties of a planar antenna on a photonic-crystal substrate journal January 1993
Photonic Band Structure book January 1990
Donor and acceptor modes in photonic band structure journal December 1991
Measurement of photonic band structure in a two-dimensional periodic dielectric array journal March 1992
Existence of a photonic gap in periodic dielectric structures journal December 1990
Enhancement and inhibition of radiation in cylindrically symmetric, periodic structures journal January 1993
Photonic band structure: The face-centered-cubic case employing nonspherical atoms journal October 1991