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Title: Process for etching mixed metal oxides

Patent ·
OSTI ID:869558
 [1];  [2]
  1. Edgewood, NM
  2. Evergreen, CO
+ Show Author Affiliations

An etching process using dicarboxylic and tricarboxylic acids as chelating etchants for mixed metal oxide films such as high temperature superconductors and ferroelectric materials. Undesirable differential etching rates between different metal oxides are avoided by selection of the proper acid or combination of acids. Feature sizes below one micron, excellent quality vertical edges, and film thicknesses in the 100 Angstom range may be achieved by this method.

Research Organization:
AT&T
DOE Contract Number:
AC04-76DP00789
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5356516
OSTI ID:
869558
Country of Publication:
United States
Language:
English

References (3)

Machining of PZT, PT and (Mn, Zn)Fe 2 O 4 Ceramics by Laser-Induced Chemical Etching journal January 1987
Improved aqueous etchant for high T c superconductor materials journal April 1992
Wet Chemical Etching of High T C Superconductors by Ethylenediaminetetraacetic Acid (EDTA) journal January 1989

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Related Subjects

process
etching
mixed
metal
oxides
dicarboxylic
tricarboxylic
acids
chelating
etchants
oxide
films
temperature
superconductors
ferroelectric
materials
undesirable
differential
rates
avoided
selection
proper
acid
combination
feature
sizes
below
micron
excellent
quality
vertical
edges
film
thicknesses
100
angstom
range
achieved
method
temperature superconductors
film thickness
etching process
oxide films
temperature superconductor
mixed metal
metal oxide
metal oxides
oxide film
carboxylic acids
carboxylic acid
feature sizes
ferroelectric material
ferroelectric materials
differential etch
/216/