skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: ECR apparatus with magnetic coil for plasma refractive index control

Patent ·
OSTI ID:869262
 [1]
  1. Oak Ridge, TN
+ Show Author Affiliations

The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
DOE Contract Number:
AC05-84OR21400
Assignee:
Sematech, Inc. (Austin, TX)
Patent Number(s):
US 5306985
OSTI ID:
869262
Country of Publication:
United States
Language:
English

References (9)

Optimized microwave coupling in an electron cyclotron resonance etch tool
  • Stevens, J. E.; Cecchi, J. L.; Huang, Y. C.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 9, Issue 3 https://doi.org/10.1116/1.577346
journal May 1991
Microwave Plasma Etching journal November 1977
Electron cyclotron resonance microwave ion sources for thin film processing journal May 1991
Electron cyclotron resonance microwave discharges for etching and thin‐film deposition journal May 1989
Extremely high selective, highly anisotropic, and high rate electron cyclotron resonance plasma etching for n+ poly-Si at the electron cyclotron resonance position journal November 1990
High Performance Electron Cyclotron Resonance Plasma Etching with Control of Magnetic Field Gradient journal November 1991
Behavior of Ar plasmas formed in a mirror field electron cyclotron resonance microwave ion source
  • Gorbatkin, S. M.; Berry, L. A.; Roberto, J. B.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 8, Issue 3 https://doi.org/10.1116/1.576645
journal May 1990
Potential applications of an electron cyclotron resonance multicusp plasma source
  • Tsai, C. C.; Berry, L. A.; Gorbatkin, S. M.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 8, Issue 3 https://doi.org/10.1116/1.576646
journal May 1990
Microwave plasma: its characteristics and applications in thin film technology journal January 1986

Similar Records

ECR apparatus with magnetic coil for plasma refractive index control
Patent · Tue Apr 26 00:00:00 EDT 1994 · OSTI ID:869262
Optimized ECR plasma apparatus with varied microwave window thickness
Patent · Tue Nov 14 00:00:00 EST 1995 · OSTI ID:869262
Optimized ECR plasma apparatus with varied microwave window thickness
Patent · Sun Jan 01 00:00:00 EST 1995 · OSTI ID:869262

Related Subjects

ecr
apparatus
magnetic
coil
plasma
refractive
index
control
describes
technique
radial
profile
microwave
power
discharge
provide
uniform
density
specimen
energy
absorption
desired
controlling
transmitted
window
reactor
controlled
advantage
transmission
characteristics
variations
changing
coupler
design
reactor design
radial profile
plasma density
ecr plasma
microwave window
magnetic coil
transmission characteristics
uniform energy
uniform plasma
plasma discharge
energy absorption
refractive index
microwave power
wave coupler
power transmitted
microwave coupler
/315/118/204/