skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Apparatus and method to enhance X-ray production in laser produced plasmas

Patent ·
OSTI ID:868617

Method and apparatus for generating x-rays for use in, for instance, x-ray photolithography. The method of generating x-rays includes the steps of providing a target and irradiating the target with a laser system which produces a train of sub-pulses to generate an x-ray producing plasma. The sub-pulses are of both high intensity and short duration. The apparatus for generating x-rays from a plasma includes a vacuum chamber, a target supported within the chamber and a laser system, including a short storage time laser.

Research Organization:
AT&T
DOE Contract Number:
AC04-76DP00789
Assignee:
Sandia Corporation-Org. 250 (Albuquerque, NM)
Patent Number(s):
US 5175757
OSTI ID:
868617
Country of Publication:
United States
Language:
English

References (10)

Microlithography Using A Laser Plasma Created X-Ray Source conference June 1988
Recent Applications Of Laser-Produced Plasma X-Ray Sources conference October 1986
Quenched-Laser Operation Of A Littman Dye Oscillator conference June 1988
Submicron x‐ray lithography using laser‐produced plasma as a source journal October 1983
Laser plasma x‐ray sources for microlithography journal February 1988
X‐ray emission from plasmas generated by an XeCl laser picosecond pulse train journal December 1989
X-ray sources for microlithography created by laser radiation at λ=0.26 μm journal January 1987
Plasma x‐ray source for lithography generated by a ≊30 J, 30 ns KrF laser journal October 1988
Observation of enhanced x‐ray emission from long‐pulse‐width laser‐produced plasmas journal September 1989
Laser Created X-Ray Sources For Microlithography conference December 1987