Ionization chamber dosimeter

Patent · Tue Jan 01 00:00:00 EST 1991

OSTI ID:868046

Renner, Tim R ^[1]; Nyman, Mark A ^[1]; Stradtner, Ronald ^[2]

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1. Berkeley, CA
2. Kensington, CA

A method for fabricating an ion chamber dosimeter collecting array of the type utilizing plural discrete elements formed on a uniform collecting surface which includes forming a thin insulating layer over an aperture in a frame having surfaces, forming a predetermined pattern of through holes in the layer, plating both surfaces of the layer and simultaneously tilting and rotating the frame for uniform plate-through of the holes between surfaces. Aligned masking and patterned etching of the surfaces provides interconnects between the through holes and copper leads provided to external circuitry.

• Research Organization: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
• DOE Contract Number: AC03-76SF00098
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 5061216
• OSTI ID: 868046
• Country of Publication: United States
• Language: English

Related Subjects

ionization
chamber
dosimeter
method
fabricating
collecting
array
type
utilizing
plural
discrete
elements
formed
uniform
surface
forming
insulating
layer
aperture
frame
surfaces
predetermined
pattern
holes
plating
simultaneously
tilting
rotating
plate-through
aligned
masking
patterned
etching
provides
interconnects
copper
leads
provided
external
circuitry
external circuit
insulating layer
ionization chamber
predetermined pattern
elements formed
external circuitry
chamber dosimeter
collecting surface
type utilizing
/445/427/