Method for fabricating photovoltaic device having improved short wavelength photoresponse
Patent
·
OSTI ID:867024
- P.O. Box 557, Rushland, PA 18956
Amorphous p-i-n silicon photovoltaic cells with improved short wavelength photoresponse are fabricated with reduced p-dopant contamination at the p/i interface. Residual p-dopants are removed by flushing the deposition chamber with a gaseous mixture capable of reacting with excess doping contaminants prior to the deposition of the i-layer and subsequent to the deposition of the p-layer.
- DOE Contract Number:
- ZB4030563
- Assignee:
- Catalano; Anthony W. (P.O. Box 557, Rushland, PA 18956)
- Patent Number(s):
- US 4845043
- Application Number:
- 07/041,532
- OSTI ID:
- 867024
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
method
fabricating
photovoltaic
device
improved
wavelength
photoresponse
amorphous
p-i-n
silicon
cells
fabricated
reduced
p-dopant
contamination
interface
residual
p-dopants
removed
flushing
deposition
chamber
gaseous
mixture
capable
reacting
excess
doping
contaminants
prior
i-layer
subsequent
p-layer
photovoltaic cells
deposition chamber
gaseous mixture
photovoltaic device
photovoltaic cell
silicon photovoltaic
wavelength photoresponse
mixture capable
/438/136/427/
fabricating
photovoltaic
device
improved
wavelength
photoresponse
amorphous
p-i-n
silicon
cells
fabricated
reduced
p-dopant
contamination
interface
residual
p-dopants
removed
flushing
deposition
chamber
gaseous
mixture
capable
reacting
excess
doping
contaminants
prior
i-layer
subsequent
p-layer
photovoltaic cells
deposition chamber
gaseous mixture
photovoltaic device
photovoltaic cell
silicon photovoltaic
wavelength photoresponse
mixture capable
/438/136/427/