Poly(silyl silane)homo and copolymers

Patent · Sun Jan 01 00:00:00 EST 1989

OSTI ID:866913

Zeigler, John M ^[1]

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1. 2208 Lester Dr. NE., Albuquerque, NM 87112

Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

• Research Organization: AT&T
• DOE Contract Number: AC04-76DP00789
• Assignee: John M. Zeigler (Albuquerque, NM)
• Patent Number(s): US 4820788
• OSTI ID: 866913
• Country of Publication: United States
• Language: English

Related Subjects

poly
silyl
silane
homo
copolymers
silanes
prepared
photosensitivity
excellent
resistance
oxygen-reactive
etching
processes
useful
photodepolymerizable
photoresists
barrier
layers
etc
etching process
barrier layer
barrier layers
silyl silanes
silyl silane
excellent resistance
etching processes
photodepolymerizable photoresists
/528/430/999/