Method and apparatus for removing and preventing window deposition during photochemical vapor deposition (photo-CVD) processes

Patent · Sun Jan 01 00:00:00 EST 1989

OSTI ID:866895

Tsuo, Simon ^[1]; Langford, Alison A ^[2]

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1. Lakewood, CO
2. Boulder, CO

Unwanted build-up of the film deposited on the transparent light-transmitting window of a photochemical vacuum deposition (photo-CVD) chamber is eliminated by flowing an etchant into the part of the photolysis region in the chamber immediately adjacent the window and remote from the substrate and from the process gas inlet. The respective flows of the etchant and the process gas are balanced to confine the etchant reaction to the part of the photolysis region proximate to the window and remote from the substrate. The etchant is preferably one that etches film deposit on the window, does not etch or affect the window itself, and does not produce reaction by-products that are deleterious to either the desired film deposited on the substrate or to the photolysis reaction adjacent the substrate.

• Research Organization: Midwest Research Institute, Kansas City, MO (United States)
• DOE Contract Number: AC02-83CH10093
• Assignee: Midwest Research Institute (Kansas City, MO)
• Patent Number(s): US 4816294
• OSTI ID: 866895
• Country of Publication: United States
• Language: English

Related Subjects

method
apparatus
removing
preventing
window
deposition
photochemical
vapor
photo-cvd
processes
unwanted
build-up
film
deposited
transparent
light-transmitting
vacuum
chamber
eliminated
flowing
etchant
photolysis
region
immediately
adjacent
remote
substrate
process
gas
inlet
respective
flows
balanced
confine
reaction
proximate
preferably
etches
deposit
etch
affect
produce
by-products
deleterious
desired
photolysis region
vacuum deposition
process gas
gas inlet
chemical vapor
vapor deposition
immediately adjacent
film deposited
photochemical vapor
transparent light
light-transmitting window
/427/136/216/