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Title: Electron-beam-induced information storage in hydrogenated amorphous silicon device

Patent ·
OSTI ID:865991

A method for recording and storing information in a hydrogenated amorphous silicon device, comprising: depositing hydrogenated amorphous silicon on a substrate to form a charge-collection device; and generating defects in the hydrogenated amorphous silicon device, wherein the defects act as recombination centers that reduce the lifetime of carriers, thereby reducing charge-collection efficiency; and thus in the charge-collection mode of scanning probe instruments, regions of the hydrogenated amorphous silicon device that contain the defects appear darker in comparison to regions of the device that do not contain the defects, leading to a contrast formation for pattern recognition and information storage, in the device, which darkened areas can be restored to their original charge-collection efficiency by heating the hydrogenated amorphous silicon to a temperature of about 100.degree. C. to 250.degree. C. for a sufficient period of time to provide for such restoration.

Research Organization:
Midwest Research Institute, Kansas City, MO (United States)
DOE Contract Number:
AC02-83CH10093
Assignee:
United State of America as represented by United States (Washington, DC)
Patent Number(s):
US 4613519
OSTI ID:
865991
Country of Publication:
United States
Language:
English