Graphoepitaxy by encapsulation
Patent
·
OSTI ID:865744
- Acton, MA
- Sudbury, MA
- Brookline, MA
- Lexington, MA
Improvements on the graphoepitaxial process for obtaining epitaxial or preferred orientation films are described wherein a cap of material is formed over the film to be oriented, artificial surface-relief structure may be present in the substrate, the cap, or both, and the film may be heated by irradiation with electromagnetic radiation.
- Research Organization:
- Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
- DOE Contract Number:
- AC02-80ER10179
- Assignee:
- Massachusetts Institute of Technology (Cambridge, MA)
- Patent Number(s):
- US 4565599
- OSTI ID:
- 865744
- Country of Publication:
- United States
- Language:
- English
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