Graphoepitaxy by encapsulation

Patent · Wed Jan 01 00:00:00 EST 1986

OSTI ID:865744

Geis, Michael W ^[1]; Smith, Henry I ^[2]; Antoniadis, Dimitri A ^[3]; Flanders, Dale C ^[4]

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1. Acton, MA
2. Sudbury, MA
3. Brookline, MA
4. Lexington, MA

Improvements on the graphoepitaxial process for obtaining epitaxial or preferred orientation films are described wherein a cap of material is formed over the film to be oriented, artificial surface-relief structure may be present in the substrate, the cap, or both, and the film may be heated by irradiation with electromagnetic radiation.

• Research Organization: Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
• DOE Contract Number: AC02-80ER10179
• Assignee: Massachusetts Institute of Technology (Cambridge, MA)
• Patent Number(s): US 4565599
• OSTI ID: 865744
• Country of Publication: United States
• Language: English

Related Subjects

graphoepitaxy
encapsulation
improvements
graphoepitaxial
process
obtaining
epitaxial
preferred
orientation
films
described
cap
material
formed
film
oriented
artificial
surface-relief
structure
substrate
heated
irradiation
electromagnetic
radiation
electromagnetic radiation
/117/148/