Scattering apodizer for laser beams

Patent · Tue Jan 01 00:00:00 EST 1985

OSTI ID:865564

Summers, Mark A ^[1]; Hagen, Wilhelm F ^[1]; Boyd, Robert D ^[1]

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1. Livermore, CA

A method is disclosed for apodizing a laser beam to smooth out the production of diffraction peaks due to optical discontinuities in the path of the laser beam, such method comprising introduction of a pattern of scattering elements for reducing the peak intensity in the region of such optical discontinuities, such pattern having smoothly tapering boundaries in which the distribution density of the scattering elements is tapered gradually to produce small gradients in the distribution density, such pattern of scattering elements being effective to reduce and smooth out the diffraction effects which would otherwise be produced. The apodizer pattern may be produced by selectively blasting a surface of a transparent member with fine abrasive particles to produce a multitude of minute pits. In one embodiment, a scattering apodizer pattern is employed to overcome diffraction patterns in a multiple element crystal array for harmonic conversion of a laser beam. The interstices and the supporting grid between the crystal elements are obscured by the gradually tapered apodizer pattern of scattering elements.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 4537475
• OSTI ID: 865564
• Country of Publication: United States
• Language: English

Related Subjects

scattering
apodizer
laser
beams
method
disclosed
apodizing
beam
smooth
production
diffraction
peaks
due
optical
discontinuities
path
comprising
introduction
pattern
elements
reducing
peak
intensity
region
smoothly
tapering
boundaries
distribution
density
tapered
gradually
produce
gradients
effective
reduce
effects
otherwise
produced
selectively
blasting
surface
transparent
fine
abrasive
particles
multitude
minute
pits
embodiment
employed
overcome
patterns
multiple
element
crystal
array
harmonic
conversion
interstices
supporting
grid
obscured
method comprising
abrasive particles
laser beams
laser beam
diffraction pattern
peak intensity
multiple element
diffraction effects
harmonic conversion
crystal elements
comprising introduction
gradually tapered
diffraction effect
/359/