Plasma Processing of Advanced Materials
Plasma Processing of Advanced Materials The project had the overall objective of improving our understanding of the influences of process parameters on the properties of advanced superhard materials. The focus was on high rate deposition processes using thermal plasmas and atmospheric pressure glow discharges, and the emphasis on superhard materials was chosen because of the potential impact of such materials on industrial energy use and on the environment. In addition, the development of suitable diagnostic techniques was pursued. The project was divided into four tasks: (1) Deposition of superhard boron containing films using a supersonic plasma jet reactor (SPJR), and the characterization of the deposition process. (2) Deposition of superhard nanocomposite films in the silicon-nitrogen-carbon system using the triple torch plasma reactor (TTPR), and the characterization of the deposition process. (3) Deposition of films consisting of carbon nanotubes using an atmospheric pressure glow discharge reactor. (4) Adapting the Thomson scattering method for characterization of atmospheric pressure non-uniform plasmas with steep spatial gradients and temporal fluctuations. This report summarizes the results.
- Research Organization:
- University of Minnesota, Minneapolis, MN
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- FG02-85ER13433
- OSTI ID:
- 850406
- Report Number(s):
- DOE/ER/13433; TRN: US200707%%252
- Country of Publication:
- United States
- Language:
- English
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