Investigation of Oxide Layer Structure on Niobium Surfaces using a Secondary Ion Mass Spectrometer
Oxide layer structure on the surfaces of niobium (Nb) can be studied by continuously monitoring peaks of the secondary ions of Nb and its relevant oxides as a function of time during depth profiling measurements employing a secondary ion mass spectrometer (SIMS). This is based on the fact that different oxides have different cracking patterns. This new approach is much simpler and easier for studying oxide layer structure on Nb surfaces than the conventional approach through deconvolution of oxide peaks obtained from an x-ray photoemission spectrometer. Eventually it can be developed into an in-situ tool for monitoring the oxide layer structure on Nb surfaces prepared by various procedures. Preliminary results of SIMS measurements on the surfaces of Nb samples treated by buffered electropolishing and buffered chemical polishing will be reported.
- Research Organization:
- TJNAF (Thomas Jefferson National Accelerator Facility, Newport News, VA)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-84ER40150
- OSTI ID:
- 850145
- Report Number(s):
- JLAB-ACT-05-364; DOE/ER/40150-3568; TRN: US200518%%126
- Resource Relation:
- Conference: 12th SRF Workshop, Cornell University, July 10, 2005
- Country of Publication:
- United States
- Language:
- English
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