Coating strategy for enhancing illumination uniformity in a lithographic condenser
Conference
·
OSTI ID:83117
A three-element Koehler condenser system has been fabricated, characterized, and integrated into an EUV lithographic system. The multilayer coatings deposited on the optics were designed to provide optimal radiation transport efficiency and illumination uniformity. Extensive EUV characterization measurements performed on the individual optics and follow-on system measurements indicated that the condenser was operating close to design goals. Multilayer d-spacings were within 0.05 nm of specifications, and reflectances were approximately 60%. Illumination uniformity was better than {plus_minus}10%. The broadband transport efficiency was 11%.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 83117
- Report Number(s):
- UCRL-JC-119629; CONF-9409177-8; ON: DE95014371; TRN: 95:017317
- Resource Relation:
- Conference: Optical Society of America conference on extreme ultraviolet lithography, Monterey, CA (United States), 19-21 Sep 1994; Other Information: PBD: 26 Jan 1995
- Country of Publication:
- United States
- Language:
- English
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