Modeling, monitoring and control based on neural networks
The cost of a fabrication line such as one in a semiconductor house has increased dramatically over the years and it is possibly already past the point that some new start-up company can have sufficient capital to build a new fabrication line. Such capital-intensive manufacturing needs better utilization of resources and management of equipment to maximize its productivity. In order to maximize the return from such a capital-intensive manufacturing line, we need to address the following: (1) increasing the yield, (2) enhancing the flexibility of the fabrication line, (3) improving quality, and finally (4) minimizing the down time of the processing equipment. Because of the significant advances now made in the fields of artificial neural networks, fuzzy logic, machine learning and genetic algorithms, we advocate the use of these new tools to in manufacturing. We term the applications of these and other tools that mimic human intelligence to manufacturing neural manufacturing. This paper will address the effort at Lawrence Livermore National Laboratory (LLNL) to use artificial neural networks to address certain semiconductor process modeling, monitoring and control questions.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 82436
- Report Number(s):
- UCRL-JC-120672; CONF-950412-15; ON: DE95012455
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 17-21 Apr 1995; Other Information: PBD: 14 Apr 1995
- Country of Publication:
- United States
- Language:
- English
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