In-situ Reflectance Monitoring of GaSb Substrate Oxide Desorption
The use of specular reflectance to monitor GaSb substrate oxide desorption in-situ is reported. Substrates were loaded into the organometallic vapor phase epitaxy reactor either as-received (epi-ready) or after receiving a solvent degrease, acid etch and rinse. A variety of surface preparations and anneal conditions were investigated. HCL was used as the etchant, and in certain cases was followed by an additional etch in Br{sub 2}-HCl-HNO{sub 3}-CH{sub 3}COOH for comparison. Rinse comparisons included 2-propanol, methanol, and deionized water. Substrates were heated to either 525, 550, or 575 C. Features observed in the in-situ reflectance associated with the oxide desorption process were interpreted based on the starting oxide chemistry and thickness. Based on in-situ reflectance and ex-situ atomic force microscopy data, a recommendation on a reproducible GaSb substrate preparation technique suitable for high-quality epitaxial growth is suggested.
- Research Organization:
- Lockheed Martin Corporation, Schenectady, NY 12301 (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC12-00SN39357
- OSTI ID:
- 821306
- Report Number(s):
- LM-00K070; TRN: US200409%%125
- Resource Relation:
- Other Information: PBD: 21 Aug 2000
- Country of Publication:
- United States
- Language:
- English
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