Macro stress mapping on thin film buckling

Conference · Wed Nov 06 00:00:00 EST 2002

OSTI ID:807428

Goudeau, P; Villain, P; Renault, P -O; Tamura, N; Celestre, R S; Padmore, H A

Thin films deposited by Physical Vapour Deposition techniques on substrates generally exhibit large residual stresses which may be responsible of thin film buckling in the case of compressive stresses. Since the 80's, a lot of theoretical work has been done to develop mechanical models but only a few experimental work has been done on this subject to support these theoretical approaches and nothing concerning local stress measurement mainly because of the small dimension of the buckling (few 10th mm). This paper deals with the application of micro beam X-ray diffraction available on synchrotron radiation sources for stress mapping analysis of gold thin film buckling.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Director, Office of Science. Office of Basic Energy Studies (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 807428
• Report Number(s): LBNL-51711; R&D Project: A580ES; B& R KC0204016; TRN: US0301830
• Resource Relation: Conference: 6th European Conference on Residual Stresses, Coimbra (PT), 07/10/2002--07/13/2002; Other Information: PBD: 6 Nov 2002
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
43 PARTICLE ACCELERATORS
BUCKLING
DEPOSITION
DIMENSIONS
GOLD
RESIDUAL STRESSES
STRESSES
SUBSTRATES
SYNCHROTRON RADIATION SOURCES
THIN FILMS
X-RAY DIFFRACTION
STRESS MEASUREMENTS THIN FILMS BUCKLINGS