Effects of the amorphous oxide intergranular layer structure and bonding on the fracture toughness of a high purity silicon nitride

Conference · Mon Nov 18 00:00:00 EST 2002

OSTI ID:806140

Ziegler, A; Kisielowski, C; Hoffmann, M J; Ritchie, R O

The microstructural evolution and structural characteristics and transitions in the thin grain-boundary oxide films in a silicon nitride ceramic, specifically between two adjacent grains and not the triple junctions, are investigated to find their effect on the macroscopic fracture properties. It is found that by heat treating a model Si3N4-2wt percent Y2O3 ceramic for {approx}200 hr at 1400 degrees C in air, the fracture toughness can be increased by {approx}100 percent, coincident with a change in fracture mechanism from transgranular to intergranular.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Director, Office of Science (US)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 806140
• Report Number(s): LBNL-51736; R&D Project: 511906; B& R KC0201030; TRN: US200303%%573
• Resource Relation: Conference: MRS Symposium on Structure-Property Relationships of Exide Surfaces and Interfaces--Fall MRS Meeting, Boston, MA (US), 12/02/2002--12/06/2002; Other Information: PBD: 18 Nov 2002
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AIR
BONDING
CERAMICS
FRACTURE PROPERTIES
FRACTURES
OXIDES
SILICON NITRIDES