skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: System integration and performance of the EUV engineering test stand

Abstract

The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k{sub 1} of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features.

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; more »; ; ; ; ; ; ; ; ; ; ; « less
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Advanced Light Source (US)
Sponsoring Org.:
USDOE Director, Office of Science. Office of Basic Energy Studies. Materials Science and Engineering Division (US)
OSTI Identifier:
796103
Report Number(s):
LBNL-50208; LBNL/ALS-13669
R&D Project: 833605; TRN: US0201419
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Conference
Resource Relation:
Conference: 26th Annual International Symposium on Microlithography, Santa Clara, CA (US), 02/25/2001--03/02/2001; Other Information: PBD: 1 Mar 2001
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; DESIGN; FABRICATION; LASER-PRODUCED PLASMA; PERFORMANCE; TEST FACILITIES; EXTREME ULTRAVIOLET RADIATION; ADVANCED LIGHT SOURCE; QUANTUM CHAOS PHOTOIONIZATION HELIUM ADVANCED LIGHT SOURCE ALS

Citation Formats

Tichenor, Daniel A, Ray-Chaudhuri, Avijit K, Replogle, William C, Stulen, Richard H, Kubiak, Glenn D, Rockett, Paul D, Klebanoff, Leonard E, Jefferson, Karen L, Leung, Alvin H, Wronosky, John B, Hale, Layton C, Chapman, Henry N, Taylor, John S, Folta, James A, Montcalm, Claude, Soufli, Regina, Spiller, Eberhard, Blaedel, Kenneth, Sommargren, Gary E, Sweeney, Donald W, Naulleau, Patrick, Goldberg, Kenneth A, Gullikson, Eric M, Bokor, Jeffrey, Batson, Phillip J, Attwood, David T, Jackson, Keith H, Hector, Scott D, Gwyn, Charles W, Yan, Pei-Yang, and Yan, P. System integration and performance of the EUV engineering test stand. United States: N. p., 2001. Web.
Tichenor, Daniel A, Ray-Chaudhuri, Avijit K, Replogle, William C, Stulen, Richard H, Kubiak, Glenn D, Rockett, Paul D, Klebanoff, Leonard E, Jefferson, Karen L, Leung, Alvin H, Wronosky, John B, Hale, Layton C, Chapman, Henry N, Taylor, John S, Folta, James A, Montcalm, Claude, Soufli, Regina, Spiller, Eberhard, Blaedel, Kenneth, Sommargren, Gary E, Sweeney, Donald W, Naulleau, Patrick, Goldberg, Kenneth A, Gullikson, Eric M, Bokor, Jeffrey, Batson, Phillip J, Attwood, David T, Jackson, Keith H, Hector, Scott D, Gwyn, Charles W, Yan, Pei-Yang, & Yan, P. System integration and performance of the EUV engineering test stand. United States.
Tichenor, Daniel A, Ray-Chaudhuri, Avijit K, Replogle, William C, Stulen, Richard H, Kubiak, Glenn D, Rockett, Paul D, Klebanoff, Leonard E, Jefferson, Karen L, Leung, Alvin H, Wronosky, John B, Hale, Layton C, Chapman, Henry N, Taylor, John S, Folta, James A, Montcalm, Claude, Soufli, Regina, Spiller, Eberhard, Blaedel, Kenneth, Sommargren, Gary E, Sweeney, Donald W, Naulleau, Patrick, Goldberg, Kenneth A, Gullikson, Eric M, Bokor, Jeffrey, Batson, Phillip J, Attwood, David T, Jackson, Keith H, Hector, Scott D, Gwyn, Charles W, Yan, Pei-Yang, and Yan, P. 2001. "System integration and performance of the EUV engineering test stand". United States. https://www.osti.gov/servlets/purl/796103.
@article{osti_796103,
title = {System integration and performance of the EUV engineering test stand},
author = {Tichenor, Daniel A and Ray-Chaudhuri, Avijit K and Replogle, William C and Stulen, Richard H and Kubiak, Glenn D and Rockett, Paul D and Klebanoff, Leonard E and Jefferson, Karen L and Leung, Alvin H and Wronosky, John B and Hale, Layton C and Chapman, Henry N and Taylor, John S and Folta, James A and Montcalm, Claude and Soufli, Regina and Spiller, Eberhard and Blaedel, Kenneth and Sommargren, Gary E and Sweeney, Donald W and Naulleau, Patrick and Goldberg, Kenneth A and Gullikson, Eric M and Bokor, Jeffrey and Batson, Phillip J and Attwood, David T and Jackson, Keith H and Hector, Scott D and Gwyn, Charles W and Yan, Pei-Yang and Yan, P},
abstractNote = {The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k{sub 1} of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features.},
doi = {},
url = {https://www.osti.gov/biblio/796103}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Mar 01 00:00:00 EST 2001},
month = {Thu Mar 01 00:00:00 EST 2001}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

Save / Share: