Atomic transport at liquid metal/Al{sub 2}O{sub 3} interfaces
Journal Article
·
· Defect and Diffusion Forum
OSTI ID:795977
In this work, atomic force microscopy (AFM) has been used to identify the controlling transport mechanisms at metal/oxide interfaces and measure the corresponding diffusivities. Interfacial transport rates in our experiments are two to four orders of magnitude faster than any previously reported rates for the oxide surface. The interfacial diffusivities and the degree of interfacial anisotropy depend on the oxygen activity of the system. Atomic transport at metal/oxide interfaces plays a defining role in many technological processes, and these experiments provide fundamental data for the formulation of the atomic theory needed to explain many of the observed phenomena.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Director, Office of Science (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 795977
- Report Number(s):
- LBNL-49873; R&D Project: 512401; TRN: US200212%%249
- Journal Information:
- Defect and Diffusion Forum, Vol. 194-199; Other Information: Journal Publication Date: 2001; PBD: 12 Oct 2000
- Country of Publication:
- United States
- Language:
- English
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