Strain and Texture in Al-Interconnect Wires Measured by X-Ray Microbeam Diffraction

Conference · Mon Apr 05 00:00:00 EDT 1999

OSTI ID:7925

Budai, J D; Chung, J -S; Ice, G E; Larson, B C; Lowe, W P; Tamura, N; Tischler, J Z; Williams, E L; Yoon, M

The local strain and texture in Al interconnect wires have been investigated using white and monochromatic x-ray microbeams on the MHATTCAT undulator beam line at the Advanced Photon Source. Intergrain and intragrain orientations were obtained with ~0.01 degree sensitivity using white beam measurements on wide Al pads (~100 Mu-m) and thin (2 Mu-m) Al wires. Orientation changes of up to 1 degree were found within individual grains of the (111) textured Al interconnects. Deviatoric strain measurements indicate small intragranular strain variations, but intergranular strain variations were found to be quite large.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: AC05-96OR22464
• OSTI ID: 7925
• Report Number(s): ORNL/CP-103187; KC 02 02 04 0; ON: DE00007925
• Resource Relation: Conference: Spring Meeting of the Materials Research Society, San Francisco, CA, April 5-9, 1999
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
Strains
Texture
Aluminium
Wires
X-Ray Diffraction
Connectors