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Title: Fabrication of Photonic band gap Materials

Abstract

A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microsphere, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microsphere there from. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microsphere may be polystyrenemicrosphere.

Inventors:
; ; ;
Publication Date:
Research Org.:
Ames Lab., Ames, IA (US)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
784376
Patent Number(s):
PATENTS-US-A9477191; US patents application 9-477,191
Application Number:
9-477,191; TRN: AH200129%%217
Assignee:
DOEGC; EDB-01:075486
DOE Contract Number:  
W-7405-ENG-82
Resource Type:
Patent Application
Resource Relation:
Patent File Date: 2000 Jan 05; Other Information: PBD: 5 Jan 2000
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CERAMICS; DIELECTRIC MATERIALS; DRYING; FABRICATION; MICROSPHERES; POLYMERS; SEMICONDUCTOR MATERIALS

Citation Formats

Constant, Kristen, Subramania, Ganapathi S, Biswas, Rana, and Ho, Kai-Ming. Fabrication of Photonic band gap Materials. United States: N. p., 2000. Web.
Constant, Kristen, Subramania, Ganapathi S, Biswas, Rana, & Ho, Kai-Ming. Fabrication of Photonic band gap Materials. United States.
Constant, Kristen, Subramania, Ganapathi S, Biswas, Rana, and Ho, Kai-Ming. 2000. "Fabrication of Photonic band gap Materials". United States. https://www.osti.gov/servlets/purl/784376.
@article{osti_784376,
title = {Fabrication of Photonic band gap Materials},
author = {Constant, Kristen and Subramania, Ganapathi S and Biswas, Rana and Ho, Kai-Ming},
abstractNote = {A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microsphere, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microsphere there from. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microsphere may be polystyrenemicrosphere.},
doi = {},
url = {https://www.osti.gov/biblio/784376}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jan 05 00:00:00 EST 2000},
month = {Wed Jan 05 00:00:00 EST 2000}
}