Focused Ion beam source method and Apparatus
Patent Application
·
OSTI ID:782758
A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.
- Research Organization:
- Argonne National Lab., IL (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-31-109-ENG-38
- Assignee:
- DOEGC; EDB-01:069615
- Patent Number(s):
- PATENTS-US-A9134928
- Application Number:
- 9-134,928; TRN: AH200127%%5
- OSTI ID:
- 782758
- Resource Relation:
- Patent File Date: 1998 Aug 17; Other Information: PBD: 17 Aug 1998
- Country of Publication:
- United States
- Language:
- English
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