PIT INITIATION IN AlO{sub X}/Al THIN FILMS
Conference
·
OSTI ID:758980
The electrochemical responses of AlO{sub x}/Al thin films have been investigated as a function of film growth conditions which produce films with different grain orientation, size and morphology. Films with smooth, 150 nm diameter, randomly oriented grains show a higher pitting potential and lower passive current than those films with large grain-boundary grooving from a mixture of smooth micron-sized, (200)-oriented grains and 300--500 nm diameter, (220)-oriented grains. These results suggest that surface roughness from grain-boundary grooving affects the pitting resistance more strongly than does the grain boundary density.
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Energy Research (ER) (US)
- DOE Contract Number:
- AC02-98CH10886
- OSTI ID:
- 758980
- Report Number(s):
- BNL-66100; KC020102; R&D Project: AS010MSD; KC020102; TRN: AH200034%%305
- Resource Relation:
- Conference: CRITICAL FACTORS IN LOCALIZED CORROSION III, 194TH ELECTROCHEMICAL SOCIETY MEETING, BOSTON, MA (US), 11/01/1998--11/06/1998; Other Information: A SYMPOSIUM IN HONOR OF THE 70TH BIRTHDAY OF JEROME KRUGER; PBD: 1 Nov 1998
- Country of Publication:
- United States
- Language:
- English
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