skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Evaluation of low cost residual gas analyzers for ultrahigh vacuum applications

Journal Article · · Journal of Vac Sci Tech
OSTI ID:756676

In recent years several low cost computer controlled residual gas analyzers (RGAs) have been introduced into the market place. It would be very useful to know the performance characteristics of these RGAs in order to make an informed selection for UHV applications. The UHV applications include extreme sensitivity helium leak detection and monitoring of the residual gas spectra in UHV systems. In this article, the sensitivity and linearity data for nitrogen, hydrogen, and helium are presented in the pressure range 10{sup {minus}8}---10{sup {minus}1} Pa. Further, the relationships between focus voltage and ion currents, relative sensitivity, and fragmentation factor are also included. A direct comparison method is used in obtaining this data. Spinning rotor and extractor gauges are the transfer standard gauges used in Jefferson Lab's vacuum calibration facility, with which all the reported measurements here were carried out.

Research Organization:
Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
Sponsoring Organization:
USDOE Office of Energy Research (ER) (US)
DOE Contract Number:
AC05-84ER40150
OSTI ID:
756676
Report Number(s):
DOE/ER/40150-1607; JLAB-ACC-96-12; TRN: US0003227
Journal Information:
Journal of Vac Sci Tech, Other Information: Submitted to Journal of Vac Sci Tech; PBD: 1 Oct 1996
Country of Publication:
United States
Language:
English

Similar Records

Evaluation of low cost residual gas analyzers for ultrahigh vacuum applications
Journal Article · Thu May 01 00:00:00 EDT 1997 · Journal of Vacuum Science and Technology, A · OSTI ID:756676

In situ ultrahigh vacuum residual gas analyzer 'calibration'
Journal Article · Sat Nov 15 00:00:00 EST 2008 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:756676

Ultra High Vacuum Instrumentation Development Studies
Journal Article · Thu Oct 01 00:00:00 EDT 1998 · OSTI ID:756676