Field Emission and Nanostructure of Carbon Films
The results of field emission measurements of various forms of carbon films are reported. It is shown that the films nanostructure is a crucial factor determining the field emission properties. In particular, smooth, pulsed-laser deposited amorphous carbon films with both high and low sp3 contents are poor field emitters. This is similar to the results obtained for smooth nanocrystalline, sp2-bonded carbon films. In contrast, carbon films prepared by hot-filament chemical vapor deposition (HE-CVD) exhibit very good field emission properties, including low emission turn-on fields, high emission site density, and excellent durability. HF-CVD carbon films were found to be predominantly sp2-bonded. However, surface morphology studies show that these films are thoroughly nanostructured, which is believed to be responsible for their promising field emission properties.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (US)
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 755658
- Report Number(s):
- ORNL/CP-105622; TRN: AH200034%%87
- Resource Relation:
- Conference: Materials Research Society Fall Meeting, Boston, MA (US), 11/29/1999--12/03/1999; Other Information: PBD: 29 Nov 1999
- Country of Publication:
- United States
- Language:
- English
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