Highly doped p-ZnTe films and quantum well structures grown by nonequilibrium pulsed laser ablation
- Oak Ridge National lab., TN (United States). Solid State Div.
- Harvard Univ., Cambridge, MA (United States). Div. of Applied Science
Highly p-doped ZnTe films have been grown on semi-insulating GaAs (001) and unintentionally doped (p-type) GaSb (001) substrates by pulsed KrF (248 nm) excimer laser ablation of a ZnTe target through an N{sub 2} ambient, without the use of any assisting (DC or AC) plasma source. Free hole concentrations in the mid-10{sup 19} cm{sup {minus}3} to > 10{sup 20} cm{sup {minus}3} range have been obtained. This appears to be the first time that any wide band gap (E{sub g} {ge} 2 eV) II-VI compound (or other) semiconductor has been impurity-doped from the gas phase by pulsed-laser ablation (PLA). The maximum carrier concentrations also may be the highest obtained for ZnTe by any method thus far. Because pulsed laser deposition is inherently digital, attractive deposition rates can be combined with precise control of layer thickness in epitaxial multilayered structures. Typical deposition conditions are < 0.5 {angstrom} per laser pulse, with crystalline quality governed by tradeoffs between substrate temperature, pulse repetition rate, and the focused pulsed laser energy density. PLA`s capability for growth of very thin epitaxial layers is being exploited and studied through growth of doped heteroepitaxial quantum well structures in the nearly lattice-matched ZnTe/CdSe//GaSb(substrate) system. Results obtained from growth and characterization of heterostructures in this system will be presented.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 73011
- Report Number(s):
- CONF-950820-1; ON: DE95012885; TRN: AHC29519%%139
- Resource Relation:
- Conference: 11. international conference on the electronic properties of two dimensional systems, Nottingham (United Kingdom), 7-11 Aug 1995; Other Information: PBD: [1995]
- Country of Publication:
- United States
- Language:
- English
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