Thermal plasma processing of materials
Emphasis has been on plasma synthesis of fine powders, plasma Chemical Vapor Deposition (CVD), on related diagnostics, and on modeling work. Since plasma synthesis as well as plasma CVD make frequent use of plasma jets, the beginning has been devoted of plasma jets and behavior of particulates injected into such plasma jets. Although most of the construction of the Triple-Torch Plasma Reactor (TTPR) has already been done, modifications have been made in particular modifications required for plasma CVD of diamond. A new reactor designed for Counter-Flow Liquid Injection Plasma Synthesis (CFLIPS) proved to be an excellent tool for synthesis of fine powders as well as for plasma CVD. An attempt was made to model flow and temperature fields in this reactor. Substantial efforts were made to single out those parameters which govern particle size, size distribution, and powder quality in our plasma synthesis experiments. This knowledge is crucial for controlling the process and for meaningful diagnostics and modeling work. Plasma CVD of diamond films using both reactors has been very successful and we have been approached by a number of companies interested in using this technology for coating of tools.
- Research Organization:
- Minnesota Univ., Minneapolis, MN (United States). Dept. of Mechanical Engineering
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- FG02-85ER13433
- OSTI ID:
- 7228842
- Report Number(s):
- DOE/ER/13433-4; ON: DE93003118
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CERAMICS
SYNTHESIS
DIAMONDS
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
INJECTION
PARTICULATES
PLASMA JETS
POWDERS
PROGRESS REPORT
CARBON
CHEMICAL COATING
DEPOSITION
DOCUMENT TYPES
ELEMENTAL MINERALS
ELEMENTS
INTAKE
MINERALS
NONMETALS
PARTICLES
SURFACE COATING
360601* - Other Materials- Preparation & Manufacture