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Title: Field profile tailoring in a-Si:H radiation detectors

Conference ·
OSTI ID:7069674
; ; ; ; ; ; ;  [1];  [2]
  1. Lawrence Berkeley Lab., CA (USA)
  2. Xerox Palo Alto Research Center, CA (USA)

The capability of tailoring the field profile in reverse-biased a-Si:H diodes by doping and/or manipulating electrode shapes opens a way to many interesting device structures. Charge collection in a-Si:H radiation detectors is improved for high LET particle detection by inserting thin doped layers into the i-layer of the usual p-i-n diode. This buried p-i-n structure enables us to apply higher reverse-bias and the electric field is enhanced in the mid i-layer. Field profiles of the new structures are calculated and the improved charge collection process is discussed. Also discussed is the possibility of field profile tailoring by utilizing the fixed space charges in i-layers and/or manipulating electrode shapes of the reverse-biased p-i-n diodes. 10 refs., 7 figs.

Research Organization:
Lawrence Berkeley Lab., CA (USA)
Sponsoring Organization:
DOE/ER
DOE Contract Number:
AC03-76SF00098
OSTI ID:
7069674
Report Number(s):
LBL-28681; CONF-900466-2; ON: DE90009208; TRN: 90-026817
Resource Relation:
Conference: Spring meeting of the Materials Research Society, San Francisco, CA (USA), 16-21 Apr 1990
Country of Publication:
United States
Language:
English