Secondary Neutral Mass Spectrometry: The application of laser post ionization to trace surface analysis in semiconductor materials. [Fe on O-implanted Si]
Conference
·
OSTI ID:6779850
SNMS uses the secondary neutral sputtered fraction, and can increase both yield and quantitative analysis. In this paper, lasers are used to ionize and then detect the sputtered neutral particles. This method is used with oxygen ion implantation to study Fe on Si substrates. In this way, Fe could be detected at the 500 ppT level in a single monolayer. 34 refs., 6 figs. (DLC)
- Research Organization:
- Argonne National Lab., IL (USA)
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 6779850
- Report Number(s):
- CONF-881061-5; ON: DE88012036
- Resource Relation:
- Conference: Electrochemical Society fall meeting, Chicago, IL, USA, 9 Oct 1988; Other Information: Portions of this document are illegible in microfiche products
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
36 MATERIALS SCIENCE
IRON
MASS SPECTROSCOPY
USES
SILICON
CHEMICAL ANALYSIS
IMPURITIES
ION IMPLANTATION
IONIZATION
KEV RANGE 100-1000
LASERS
NEUTRAL PARTICLES
OXYGEN IONS
SPUTTERING
SURFACES
TRACE AMOUNTS
CHARGED PARTICLES
ELEMENTS
ENERGY RANGE
IONS
KEV RANGE
METALS
PARTICLES
SEMIMETALS
SPECTROSCOPY
TRANSITION ELEMENTS
400102* - Chemical & Spectral Procedures
360600 - Other Materials
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
36 MATERIALS SCIENCE
IRON
MASS SPECTROSCOPY
USES
SILICON
CHEMICAL ANALYSIS
IMPURITIES
ION IMPLANTATION
IONIZATION
KEV RANGE 100-1000
LASERS
NEUTRAL PARTICLES
OXYGEN IONS
SPUTTERING
SURFACES
TRACE AMOUNTS
CHARGED PARTICLES
ELEMENTS
ENERGY RANGE
IONS
KEV RANGE
METALS
PARTICLES
SEMIMETALS
SPECTROSCOPY
TRANSITION ELEMENTS
400102* - Chemical & Spectral Procedures
360600 - Other Materials