Mechanical failure characterization of optical components caused by laser induced damage initiated at contaminants
The goal of this research is to quantify by numerical techniques the effects of surface and subsurface absorbing defects on damage initiation and growth in high power laser optical components. The defects include laser absorbing spots (e.g., surface particulate contamination) and surface damage regions (e.g., micro-cracks and voids) which are present due to environmental exposure and fabrication processes. This report focuses on three sources of contamination that can cause damage to optical components: (1) Front surface particle contamination, (2) Back surface particle contamination, and (3) Subsurface particle contamination. The DYNA2D (non-linear structural mechanics) code was used to model the growth of damage in the glass substrate. The damage in the nominally transparent glass substrate as a result of front surface particle contamination was found to be dependent on the magnitude of the resultant pressure pulse applied to the particle and the initial area of contact between the particle and glass substrate. The pressures generated from a back surface particle being blown off the surface provided sufficient loading to severely damage (crack) the glass substrate. A subsurface Ceria dioxide particle showed a strong surface interaction that influenced the formation and direction of the damage (cracking) that ultimately resulted in the blow-out of the damaged material leaving a relatively clean crater in the glass. Crater shape and size was determined. Since fused silica is the most transparent, and therefore laser damage resistant, of the optical materials, it is used for the most at-risk optical elements. The present studies are for a fused silica substrate. Some oxides such as Ceria are transparent in the infrared and visible, but absorbing in the UV part of the spectrum. Because ICF lasers like NIF use frequency tripling, effects of such oxides must be included.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 675033
- Report Number(s):
- UCRL-ID-128908; ON: DE98058621; BR: DP0212000
- Resource Relation:
- Other Information: PBD: 1 Dec 1997
- Country of Publication:
- United States
- Language:
- English
Similar Records
3(omega) Damage: Growth Mitigation
Application of total internal reflection microscopy for laser damage studies on fused silica