Atomic sputtering in the analytical electron microscope

Conference · Mon Aug 01 00:00:00 EDT 1988

OSTI ID:6637965

Bradley, C R; Zaluzec, N J

The advent of UHV medium voltage electron microscopes has brought the microanalyst to a regime of operating conditions in which electron beam induced damage can now be introduced to metallic specimens of medium to high atomic number. We report upon calculations of electron beam induced atomic sputtering which will have bearing upon the next generation of medium voltage analytical electron microscopes. The cross-section calculations reported herein have been completed for all solid elements of the periodic table for incident electron energies up to 1.5 MeV. All computer codes needed to duplicate these computations are available through the EMMPDL. 12 refs., 2 figs., 1 tab.

• Research Organization: Argonne National Lab., IL (USA)
• DOE Contract Number: W-31109-ENG-38
• OSTI ID: 6637965
• Report Number(s): CONF-8802127-4; ON: DE89003655; TRN: 89-003282
• Resource Relation: Conference: Workshop on electron-beam induced spectroscopies at very high spatial resolution, Aussois, France, 29 Feb 1988; Other Information: Portions of this document are illegible in microfiche products
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
36 MATERIALS SCIENCE
ELECTRON BEAMS
PHYSICAL RADIATION EFFECTS
SOLIDS
SPUTTERING
CROSS SECTIONS
DAMAGE
ELECTRON MICROSCOPES
ENERGY TRANSFER
MOMENTUM TRANSFER
SPATIAL RESOLUTION
BEAMS
LEPTON BEAMS
MICROSCOPES
PARTICLE BEAMS
RADIATION EFFECTS
RESOLUTION
656003* - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)
360106 - Metals & Alloys- Radiation Effects
360605 - Materials- Radiation Effects