Plasma synthesis of high temperature ceramic films
Thin films of alumina, chromia, mullite, yttria and zirconia have been synthesized using a plasma-based method called metal plasma immersion ion implantation and deposition (Mepiiid)--a highly versatile plasma deposition technique with ion energy control. Monolithic films (a single ceramic component) and multilayer films (individual layers of different ceramic materials) were formed. The films were characterized for their composition and structure in a number of different ways, and the high temperature performance of the films was explored, particularly for their ability to maintain their integrity and adhesion when subjected to repetitive high temperature thermal cycling up 1100 C. We found that the films retain their adhesion and quality without any apparent degradation with time, even after a large number of cycles; (the tests were extended out to a total of 40 cycles each of 24 hours duration). After repetitive high temperature thermal cycling, the film-substrate adhesion was greater than {approx}70 Mpa, the instrumental limit of measurement, and the interface toughness was approximately 0.8 MPa m{sup 1/2}.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 6531
- Report Number(s):
- LBNL-42492; TRN: US200305%%761
- Resource Relation:
- Other Information: Supercedes report DE00006531; PBD: 1 Nov 1998; PBD: 1 Nov 1998
- Country of Publication:
- United States
- Language:
- English
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