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Title: Triple ion beam irradiation facility

Technical Report ·
DOI:https://doi.org/10.2172/6452719· OSTI ID:6452719

A unique ion irradiation facility consisting of three accelerators is described. The accelerators can be operated simultaneously to deliver three ion beams on one target sample. The energy ranges of the ions are 50 to 400 keV, 200 keV to 2.5 MeV, and 1.0 to 5.0 MeV. Three different ions in the appropriate mass range can be simultaneously implanted to the same depth in a target specimen as large as 100 mm/sup 2/ in area. Typical depth ranges are 0.1 to 1.0 ..mu..m. The X-Y profiles of all three ion beams are measured by a system of miniature Faraday cups. The low-voltage accelerator can periodically ramp the ion beam energy during the implantation. Three different types of target chambers are in use at this facility. The triple-beam high-vacuum chamber can hold nine transmission electron microscopy specimens at elevated temperature during a irradiation by the three simultaneous beams. A second high-vacuum chamber on the medium-voltage accelerator beamline houses a low- and high-temperature translator and a two-axis goniometer for ion channeling measurements. The third chamber on the high-energy beamline can be gas-filled for special stressed specimen irradiations. Special applications for the surface modification of materials with this facility are described. Appendixes containing operating procedures are also included. 18 refs., 27 figs., 1 tab.

Research Organization:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
DOE Contract Number:
AC05-84OR21400
OSTI ID:
6452719
Report Number(s):
ORNL/TM-10867; ON: DE89007894; TRN: 89-007966
Resource Relation:
Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English