Carborane films: Applications to first-wall problems in tokamaks

Conference · Mon Jan 01 00:00:00 EST 1990

OSTI ID:6358069

Doyle, B L; Walsh, D S; Wampler, W R; Hays, A K ^[1]; Dylla, H F; Manos, D M; Kilpatrick, S J ^[2]

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1. Sandia National Labs., Albuquerque, NM (USA)
2. Princeton Univ., NJ (USA). Plasma Physics Lab.

RF plasma-assisted CVD and sputter deposition of amorphous boron-carbon layers similar to those being used in the TFTR tokamak at the Princeton Plasma Physics Laboratory have been performed. The initial stoichiometry has been determined using Rutherford backscattering spectrometry and elastic recoil detection. Films have also been implanted with deuterium in order to determine H-isotope pumping capacity. These studies, in addition to characterizations made of layers collected on probes in TFTR, have been used to optimize the boronization parameters and to better understand the effects of boronization on TFTR. 10 refs., 3 figs.

• Research Organization: Sandia National Labs., Albuquerque, NM (USA)
• Sponsoring Organization: DOE/DP
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 6358069
• Report Number(s): SAND-90-1372C; CONF-900870-5; ON: DE91004034
• Resource Relation: Conference: 10. international symposium on boron, borides and related compounds, Albuquerque, NM (USA), 27-30 Aug 1990
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CARBORANES
CHEMICAL VAPOR DEPOSITION
FIRST WALL
AMORPHOUS STATE
SPUTTERING
TFTR TOKAMAK
THIN FILMS
BORON COMPOUNDS
CARBON COMPOUNDS
CHEMICAL COATING
DEPOSITION
FILMS
ORGANIC BORON COMPOUNDS
ORGANIC COMPOUNDS
SURFACE COATING
THERMONUCLEAR REACTOR WALLS
THERMONUCLEAR REACTORS
TOKAMAK TYPE REACTORS
700201* - Fusion Power Plant Technology- Blanket Engineering
700209 - Fusion Power Plant Technology- Component Development & Materials Testing