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Title: Positron microanalysis with high intensity beams

Conference ·
OSTI ID:6352475

One of the more common applications for a high intensity slow positron facility will be microanalysis of solid materials. In the first section of this paper some examples are given of procedures that can be developed. Since most of the attendees of this workshop are experts in positron spectroscopy, comprehensive descriptions will be omitted. With the exception of positron emission microscopy, most of the procedures will be based on those already in common use with broad beams. The utility of the methods have all been demonstrated, but material scientists use very few of them because positron microbeams are not generally available. A high intensity positron facility will make microbeams easier to obtain and partially alleviate this situation. All microanalysis techniques listed below will have a common requirement, which is the ability to locate the microscopic detail or area of interest and to focus the positron beam exclusively on it. The last section of this paper is a suggestion of how a high intensity positron facility might be designed so as to have this capability built in. The method will involve locating the specimen by scanning it with the microbeam of positrons and inducing a secondary electron image that will immediately reveal whether or not the positron beam is striking the proper portion of the specimen. This scanning positron microscope' will be a somewhat prosaic analog of the conventional SEM. It will, however, be an indispensable utility that will enhance the practicality of positron microanalysis techniques. 6 refs., 1 fig.

Research Organization:
Oak Ridge National Lab., TN (USA)
Sponsoring Organization:
DOE/ER
DOE Contract Number:
AC05-84OR21400
OSTI ID:
6352475
Report Number(s):
CONF-901105-42; ON: DE91005014
Resource Relation:
Conference: Fall meeting of the Materials Research Society, Boston, MA (USA), 24 Nov - 1 Dec 1990
Country of Publication:
United States
Language:
English