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Title: Study of semiconductor valence plasmon line shapes via electron energy-loss spectroscopy in the transmission electron microscope

Technical Report ·
DOI:https://doi.org/10.2172/6340092· OSTI ID:6340092

Electron energy-loss spectra of the semiconductors Si, AlAs, GaAs, InAs, InP, and Ge are examined in detail in the regime of outer-shell and plasmon energy losses (0--100eV). Particular emphasis is placed on modeling and analyzing the shapes of the bulk valence plasmon lines. A line shape model based on early work by Froehlich is derived and compared to single-scattering probability distributions extracted from the measured spectra. Model and data are found to be in excellent agreement, thus pointing the way to systematic characterization of the plasmon component of EELS spectra. The model is applied to three separate investigations. 82 refs.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6340092
Report Number(s):
LBL-26617; ON: DE89008152; TRN: 89-007957
Resource Relation:
Other Information: Thesis (Ph.D.). Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English