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Title: Crystalline-to-amorphous phase transition in irradiated silicon

Conference ·
OSTI ID:6304507

The amorphous(a)-to-crystalline (c) phase transition has been studied in electron(e ) and/or ion irradiated silicon (Si). The irradiations were performed in situ in the Argonne High Voltage Microscope-Tandem Facility. The irradiation of Si, at <10K, with 1-MeV e to a fluence of 14 dpa failed to induce the c-to-a transition. Whereas an irradiation, at <10K, with 1.0 or 1.5-MeV Kr+ ions induced the c-to-a transition by a fluence of approx.0.37 dpa. Alternatively a dual irradiation, at 10K, with 1.0-MeV e and 1.0 or 1.5-MeV Kr+ to a Kr+ fluence of 1.5 dpa - where the ratio of the displacement rates for e to ions was approx.0.5 - resulted in the Si specimen retaining a degree of crystallinity. These results are discussed in terms of the degree of dispersion of point defects in the primary state of damage and the mobilities of point defects.

Research Organization:
Argonne National Lab., IL (USA); Northwestern Univ., Evanston, IL (USA). Dept. of Materials Science
DOE Contract Number:
W-31-109-ENG-38
OSTI ID:
6304507
Report Number(s):
CONF-851217-40; ON: DE86006170
Resource Relation:
Conference: Materials Research Society meeting, Boston, MA, USA, 2 Dec 1985
Country of Publication:
United States
Language:
English