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Title: Theoretical investigation of extended defects in group-III nitrides

Abstract

The authors have investigated two types of extended defects commonly found in AlN, GaN and InN films using density-functional techniques. First, basal-plane stacking faults have been studied for all three compounds. Stacking-fault energies were found to be largest in AlN and smallest in GaN consistent with density-functional results for their wurtzite/zinc-blende energy differences. In addition, the 4H and 6H structures were found to have lower energies than zinc blende for all three compounds. Secondly, the authors have investigated the electronic structure and formation energy for an edge dislocation in AlN. The full-core dislocation structure was found to have a filled electronic level approximately 0.55 eV above the valence-band edge and an empty level 1.4 eV below the conduction-band edge. An open-core structure was found to have filled and empty electronic levels closer to the middle of the energy gap. Formation energies for these two geometries suggest that the full-core structure would be expected to form in p-type material whereas both are expected in n-type material.

Authors:
 [1]
  1. Sandia National Labs., Albuquerque, NM (United States). Semiconductor Material and Device Sciences Dept.
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE Assistant Secretary for Human Resources and Administration, Washington, DC (United States)
OSTI Identifier:
563177
Report Number(s):
SAND-97-3142C; CONF-971201-
ON: DE98001702; BR: YN0100000; TRN: AHC29803%%14
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: 1997 fall meeting of the Materials Research Society, Boston, MA (United States), 1-5 Dec 1997; Other Information: PBD: [1997]
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM NITRIDES; GALLIUM NITRIDES; INDIUM NITRIDES; STACKING FAULTS; EDGE DISLOCATIONS; ELECTRONIC STRUCTURE; SEMICONDUCTOR MATERIALS

Citation Formats

Wright, A F. Theoretical investigation of extended defects in group-III nitrides. United States: N. p., 1997. Web.
Wright, A F. Theoretical investigation of extended defects in group-III nitrides. United States.
Wright, A F. 1997. "Theoretical investigation of extended defects in group-III nitrides". United States. https://www.osti.gov/servlets/purl/563177.
@article{osti_563177,
title = {Theoretical investigation of extended defects in group-III nitrides},
author = {Wright, A F},
abstractNote = {The authors have investigated two types of extended defects commonly found in AlN, GaN and InN films using density-functional techniques. First, basal-plane stacking faults have been studied for all three compounds. Stacking-fault energies were found to be largest in AlN and smallest in GaN consistent with density-functional results for their wurtzite/zinc-blende energy differences. In addition, the 4H and 6H structures were found to have lower energies than zinc blende for all three compounds. Secondly, the authors have investigated the electronic structure and formation energy for an edge dislocation in AlN. The full-core dislocation structure was found to have a filled electronic level approximately 0.55 eV above the valence-band edge and an empty level 1.4 eV below the conduction-band edge. An open-core structure was found to have filled and empty electronic levels closer to the middle of the energy gap. Formation energies for these two geometries suggest that the full-core structure would be expected to form in p-type material whereas both are expected in n-type material.},
doi = {},
url = {https://www.osti.gov/biblio/563177}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Dec 01 00:00:00 EST 1997},
month = {Mon Dec 01 00:00:00 EST 1997}
}

Conference:
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