Silicon carbide mirrors for high power applications

Conference · Sun Nov 01 00:00:00 EST 1981

OSTI ID:5591225

Takacs, P. Z.

The advent of synchrotron radiation (SR) sources and high energy lasers (HEL) in recent years has brought about the need for optical materials that can withstand the harsh operating conditions in such devices. SR mirrors must be ultra-high vacuum compatible, must withstand intense x-ray irradiation without surface damage, must maintain surface figure under thermal loading and must be capable of being polished to an extremely smooth surface finish. Chemical vapor deposited (CVD) silicon carbide in combination with sintered substrate material meets these requirements and offers additional benefits as well. It is an extremely hard material and offers the possibility of being cleaned and recoated many times without degradation of the surface finish, thereby prolonging the lifetime of expensive optical components. It is an extremely strong material and offers the possibility of weight reduction over conventional mirror materials.

• Research Organization: Brookhaven National Lab., Upton, NY (USA)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC02-76CH00016
• OSTI ID: 5591225
• Report Number(s): BNL-30341; CONF-8110136-1; ON: DE82005506; TRN: 82-004949
• Resource Relation: Conference: Topical meeting on non-oxide ceramics, South Yarmouth, MA, USA, 5 Oct 1981
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
43 PARTICLE ACCELERATORS
42 ENGINEERING
LASER MIRRORS
POLISHING
REFLECTIVITY
MIRRORS
SILICON CARBIDES
CHEMICAL VAPOR DEPOSITION
SYNCHROTRONS
VAPOR DEPOSITED COATINGS
ACCELERATORS
CARBIDES
CARBON COMPOUNDS
CHEMICAL COATING
COATINGS
CYCLIC ACCELERATORS
DEPOSITION
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
SILICON COMPOUNDS
SURFACE COATING
SURFACE FINISHING
SURFACE PROPERTIES
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