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Title: Single-column-based absorption process for treating dissolver off-gas

Conference ·
OSTI ID:5365561

The fluorocarbon absorption process for krypton and xenon removal from dissolver off-gas is based on exploitation of solubility differences which exist among noble gases and other gas-phase constituents in the fluorocarbon solvent dichlorofluoromethane (refrigerant-12). Process performance and reliability have been demonstrated on an engineering scale with over 10 years of pilot plant operation, including testing with /sup 85/Kr, /sup 133/Xe, and /sup 131/I. The culmination of this work is a single-column design which results in a simplified process with improved reliability and lower cost. Data are presented summarizing recent single-column development activities. These include data plots depicting decontamination factor vs feed gas flow rate, DF vs process absorption factor (kG/L), and location of the concentration peak via the solvent flow rate. In general, 99% removal is easily obtainable for Kr, Xe, and CO/sub 2/ while attaining concentration factors on the order of 10/sup 3/ to 10/sup 4/. Further concentration of the Kr product is investigated using solid sorbent and cold trapping technologies. Effective removal of entrained fluorocarbon solvent and CO/sub 2/ from the single-column product stream is demonstrated using 13X and 5A molecular sieves, respectively. Additional separation of Xe is studied using a silver mordenite bed and compared to existing methods using cryogenic charcoal beds or selective cold trap sublimation. Regardless of the method for Xe removal, Kr is ultimately concentrated via a simple cold trap to > 90% purity from a feed gas containing 10 ppM. 14 figures.

Research Organization:
Union Carbide Corp., Oak Ridge, TN (USA). Nuclear Div.
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
5365561
Report Number(s):
K/PS-5005; CONF-820464-1; ON: DE82017052
Resource Relation:
Conference: Workshop on development of dissolver off-gas treatment, Karlsruhe, F.R. Germany, 22 Apr 1982
Country of Publication:
United States
Language:
English

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