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Title: Laser spectroscopy of sputtered atoms

Conference ·
OSTI ID:5222973

The use of laser radiation to study the sputtering process is of relatively recent origin. Much has been learned from this work about the basic physics of the sputtering process itself through measurements of velocity and excited state distributions of sputtered atoms and the effects of adsorbates on substrate sputtering yields. Furthermore, the identification, characterization, and sensitive detection of sputtered atoms by laser spectroscopy has led to the development of in situ diagnostics for impurity fluxes in the plasma edge regions of tokamaks and of ultrasensitive methods (ppB Fe in Si) for surface analysis with ultralow (picocoulomb) ion fluences. The techniques involved in this work, laser fluorescence and multiphoton resonance ionization spectroscopy, will be described and illustrations given of results achieved up to now. 55 refs., 5 figs., 1 tab.

Research Organization:
Argonne National Lab., IL (USA)
DOE Contract Number:
W-31-109-ENG-38
OSTI ID:
5222973
Report Number(s):
CONF-851174-3; ON: DE85018388
Resource Relation:
Conference: 32. national vacuum symposium and topical conference, Houston, TX, USA, 19 Nov 1985
Country of Publication:
United States
Language:
English