Sputter deposition system for controlled fabrication of multilayers
Conference
·
OSTI ID:5205090
A detailed description of a sputter deposition system constructed specifically for the fabrication of x-ray and neutron multilayer monochromators and supermirrors is given. One of the principal design criteria is to maintain precise control of film thickness and uniformity over large substrate areas. Regulation of critical system parameters is fully automated so that response to feedback control information is rapid and complicated layer thickness sequences can be deposited accurately and efficiently. The use of either dc or rf magnetron sources makes it possible to satisfy the diverse material requirements of both x-ray and neutron optics.
- Research Organization:
- Brookhaven National Lab., Upton, NY (USA)
- DOE Contract Number:
- AC02-76CH00016
- OSTI ID:
- 5205090
- Report Number(s):
- BNL-36742; CONF-850887-28; ON: DE850175215
- Resource Relation:
- Conference: SPIE international technical symposium on optical and electro-optical engineers, San Diego, CA, USA, 18 Aug 1985
- Country of Publication:
- United States
- Language:
- English
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X-ray multilayers for diffractometers, monochromators, and spectrometers; Proceedings of the Meeting, San Diego, CA, Aug. 17-19, 1988
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