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Title: Fundamentals of interruption in vacuum. Eleventh progress report

Technical Report ·
DOI:https://doi.org/10.2172/5199468· OSTI ID:5199468

During the past three months effort has concentrated on formulating a method to predict the enhancement of electrode surface field and power input occasioned by the presence of a projection on the electrode surface, during the ion sheath development period which attends the scavenging a contact gap following current interruption in vacuum. In addition, experimental evidence has been obtained to support the theory, postulated earlier, of a turn-around interval for electrons left in the gap, which preceeds the rise of the transient recovery voltage.

Research Organization:
Rensselaer Polytechnic Inst., Troy, NY (USA). Center for Electric Power Engineering
DOE Contract Number:
AC02-78ET29197
OSTI ID:
5199468
Report Number(s):
DOE/ET/29197-11; ON: DE82016236
Resource Relation:
Other Information: Portions of document are illegible
Country of Publication:
United States
Language:
English