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Title: (Preoxidation cleaning optimization for crystalline silicon)

Conference ·
OSTI ID:5137430

A series of controlled experiments has been performed in Sandia's Photovoltaic Device Fabrication Laboratory to evaluate the effect of various chemical surface treatments on the recombination lifetime of crystalline silicon wafers subjected to a high-temperature dry oxidation. From this series of experiments we have deduced a relatively simple yet effective cleaning sequence. We have also evaluated the effect of different chemical damage-removal etches for improving the recombination lifetime and surface smoothness of mechanically lapped wafers. This paper presents the methodology used, the experimental results obtained, and our experience with using this process on a continuing basis over a period of many months. 7 refs., 4 figs., 1 tab.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5137430
Report Number(s):
SAND-91-0434C; CONF-911055-3; ON: DE92000981
Resource Relation:
Conference: 22. IEEE photovoltaic specialists conference, Las Vegas, NV (United States), 7-11 Oct 1991
Country of Publication:
United States
Language:
English