NICE3 SO3 Cleaning Process in Semiconductor Manufacturing

Book · Fri Jan 29 00:00:00 EST 1999

OSTI ID:4092

Blazek, S

This fact sheet explains how Anon, Inc., has developed a novel method of removing photoresist--a light-sensitive material used to produce semiconductor wafers for computers--from the computer manufacturing process at reduced cost and greater efficiency. The new technology is technically superior to existing semiconductor cleaning methods and results in reduced use of hazardous chemicals.

• Research Organization: National Renewable Energy Laboratory, Golden, CO (US)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: AC36-99GO10337
• OSTI ID: 4092
• Report Number(s): DOE/GO-10099-593; NREL/FS-330-25027; ON: DE00004092; TRN: US200311%%481
• Resource Relation: Other Information: PBD: 29 Jan 1999
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
36 MATERIALS SCIENCE
CLEANING
COMPUTERS
EFFICIENCY
MANUFACTURING
HAZARDOUS WASTE
SEMICONDUCTORS
COMPUTER MANUFACTURING