skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Significant improvements in long trace profiler measurement performance

Conference ·
OSTI ID:390611
 [1];  [2]
  1. Brookhaven National Lab., Upton, NY (United States)
  2. Argonne National Lab., IL (United States)

A Modifications made to the Long Trace Profiler (LTP II) system at the Advanced Photon Source at Argonne National Laboratory have significantly improved the accuracy and repeatability of the instrument The use of a Dove prism in the reference beam path corrects for phasing problems between mechanical efforts and thermally-induced system errors. A single reference correction now completely removes both error signals from the measured surface profile. The addition of a precision air conditioner keeps the temperature in the metrology enclosure constant to within {+-}0.1{degrees}C over a 24 hour period and has significantly improved the stability and repeatability of the system. We illustrate the performance improvements with several sets of measurements. The improved environmental control has reduced thermal drift error to about 0.75 microradian RMS over a 7.5 hour time period. Measurements made in the forward scan direction and the reverse scan direction differ by only about 0.5 microradian RMS over a 500mm, trace length. We are now able to put 1-sigma error bar of 0.3 microradian on an average of 10 slope profile measurements over a 500mm long trace length, and we are now able to put a 0.2 microradian error bar on an average of 10 measurements over a 200mm trace length. The corresponding 1-sigma height error bar for this measurement is 1.1 run.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC02-76CH00016
OSTI ID:
390611
Report Number(s):
BNL-62825; CONF-960848-24; ON: DE96014548; TRN: 96:005995
Resource Relation:
Conference: Denver `96: 1. conference on space processing of materials, at SPIE International Society for Optical Engineering (SPIE) annual international symposium on optical science, engineering, and instrumentation, Denver, CO (United States), 4-9 Aug 1996; Other Information: PBD: Jul 1996
Country of Publication:
United States
Language:
English